Design for manufacturability through design-process integration III (26-27 February 2009, San Jose, California, United States)Singh, Vivek K; Rieger, Michael L.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, various pagings, isbn 978-0-8194-7528-2 0-8194-7528-9Conference Proceedings

Design for manufacturability through design-process integration II (28-29 February 2008, San Jose, California, USA)Singh, Vivek K; Rieger, Michael L.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7110-9, 1 v. (various pagings), isbn 978-0-8194-7110-9Conference Proceedings

DfM, the Teenage YearsLIEBMANN, Lars.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692502.1-692502.14, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper

Intel Design for Manufacturing and Evolution of Design RulesWEBB, Clair.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692503.1-692503.8, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper

Design and process integration for microelectronic manufacturing IV (23-24 February, 2006, San Jose, California, USA)Wong, Alfred K.K; Singh, Vivek K.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6199-7, 1Vol, pagination multiple, isbn 0-8194-6199-7Conference Proceedings

Design Ranking and Analysis Methodology for Standard Cells and Full Chip Physical OptimizationVASERMAN, Yosi; SHAULY, Eitan.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72750R.1-72750R.10Conference Paper

Lithography Aware Statistical Context Characterization of 40nm Logic CellsRUBIN, Mark E; KOBAYASHI, Naohiro; YANAGIHARA, Toshiaki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72751C.1-72751C.9Conference Paper

Rigorous CMP and Electroplating simulations for DFM applicationsGRANIK, Yuri; STRECKER, Norbert.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692507.1-692507.5, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper

Systematic yield estimation method applying lithography simulationKYOH, Suigen; INOUE, Soichi.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69250Q.1-69250Q.9, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper

Layout rule trends and affect upon CPU designWEBB, Clair.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 615602.1-615302.9, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

DFM requirements and solution roadmaps : The multi- layer approachCARBALLO, Juan Antonio; NASSIF, Sani.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61560Y.1-61560Y.9, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

A high aspect ratio Si-fin FinFET fabricated with 193nm scanner photolithography and thermal oxide hard mask etching techniquesLIAO, Wen-Shiang.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 615612.1-615612.5, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

Silicon IP reuse standards for design for manufacturabilityCARBALLO, Juan Antonio; SUNDARESWARAN, Savithri.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 615606.1-615606.11, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

Process Variability Band Analysis for Quantitative Optimization of Exposure ConditionsSTURTEVANT, John L; JAYARAM, Srividya; LE HONG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72751Q.1-72751Q.6Conference Paper

Verification of extraction repeating pattern efficiency from many actual device dataSHOJI, Masahiro; INOUE, Tadao; YAMABE, Masaki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72750Q.1-72750Q.8Conference Paper

Process variation in metal-oxide-metal (MOM) capacitorsWANG, Lynn Tao-Ning.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69251M.1-69251M.8, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper

OPC to improve lithographic process windowWORD, James; SAKAJIRI, Kyohei.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61561I.1-61561I.8, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

The use of process models to enhance device performance through semiconductor designMELVIN, Lawrence S; ZHANG, Daniel.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61560J.1-61560J.8, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

Computational Requirements for OPCSPENCE, Chris; GOAD, Scott.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72750U.1-72750U.9Conference Paper

Computational technology scaling from 32 nm to 28 and 22 nm through systematic layout printability verificationCAIN, Jason P; CAPODIECI, Luigi.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 727511.1-727511.10Conference Paper

Hierarchical Modeling of Spatial Variability with a 45nm ExampleKUN QIAN; NIKOLIE, Borivoje; SPANOS, Costas J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 727505.1-727505.12Conference Paper

Interval-value Based Circuit Simulation for Statistical Circuit DesignQIAN YING TANG; SPANOS, Costas J.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72750J.1-72750J.10Conference Paper

Test Structures for 40 nm Design Rule EvaluationHO, Jonathan; YAN WANG; BENJAMIN LIN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72750T.1-72750T.10Conference Paper

Global and Local Factors of On-Chip Variation of Gate LengthOSAWA, Morimi; HOSONO, Koji; ASAI, Satom et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692508.1-692508.11, issn 0277-786X, isbn 978-0-8194-7110-9Conference Paper

Systematic study of the impact of curved active and poly contours on transistor performanceMOROZ, Victor; CHOI, Munkang; LIN, Xi-Wei et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7275, issn 0277-786X, isbn 978-0-8194-7528-2 0-8194-7528-9, 1Vol, 72751B.1-72751B.10Conference Paper